COMPUTER-CONTROLLED DYNAMIC MODE MULTIDIRECTIONAL UV LITHOGRAPHY FOR 3D MICROFABRICATION
Jungkwun Kim, Mark Allen and Yong-Kyu Yoon
Computer-controlled dynamic mode multidirectional ultraviolet (UV) lithography has been demonstrated using a collimated UV light source, a substrate-holding stage equipped with two stepper motors (one for tilting and the other for rotation), a controller with programming software and a laptop computer. The tilting and rotational angles of the stage in motion are accurately controlled during UV exposure as programmed by the user to produce complex three-dimensional (3D) microstructures. Process parameters include the initial and final tilting and rotational angles of the stage, and the relative angular velocities of the two motors in addition to the normal fabrication process parameters of UV lithography such as optical dose, baking time, and developing time and condition. Symmetric patterns can be generated by a simple synchronous mode dynamic operation, where both the angular velocities of the tilting motion and the rotating motion are set equal or harmonically related. More complex and non-symmetric patterns can be obtained using a piecewise synchronous mode, where the relationship between the angular velocities of the two motors is described not with a single coefficient but with a set of coefficients. 3D structures fabricated from the synchronous mode operation include the four-leaf clover horn and the cardiac horn while the ones from the piecewise synchronous mode are a vertical triangular slab, a screwed wind vane and arbitrary shape horns. Ray trace simulation has been performed using a mathematical tool in a spherical coordinate system and the simulated 3D patterns show good agreement with the fabricated ones.
Keywords: Electronics and devices, Nanoscale science and low-D systems and Nanolithography