DOUBLE-LAYER FABRICATION SCHEME FOR LARGE-AREA POLYMERIC PHOTONIC CRYSTAL MEMBRANE ON SILICON SURFACE BY MULTIBEAM INTERFERENCE LITHOGRAPHY
A. Ping Zhang, Ryszard Burzynski, Yong-Kyu Yoon, Paras Prasad and Sailing He
We report on the fabrication of two-dimensional polymeric photonic crystal membranes on the surface of silicon using visible-light multibeam interference lithography. The structures are created by the interference of three beams of a green laser. A polymer buffer layer doped with a Rhodamine B laser dye, interlaid between the lithography layer and the silicon substrate, suppresses the effects of strong reflection and nonradiative absorption of silicon on the interference pattern. Large-area defect-free photonic crystal membranes are experimentally realized on silicon surface.
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